Thank you to all our customers who provided input about Ideate StyleManager, which we introduced about a year ago. Your feedback led to the improvements and fixes included in this May 2020 update. We couldn’t have done it without you!
- Filled and masking regions renamed from "Detail items" within usage results of the user interface
- Improved usage results for families containing older CAD Imports Object Styles
- Hatch patterns now displayed on the Fill Pattern dialog
The user interface is more consistent; fill patterns now show a preview, just like line styles and line patterns
- Line Patterns - Dimension Styles reported when used within the Family Editor
- Object Styles in Masking Regions and Filled Regions correctly reported when used within Family Editor
- Object Styles - Sketch lines correctly found when used within the Family Editor
- Off-category Object Styles display when used within the Family Editor
- Materials used within a split region merged properly
- Materials that referenced Global Parameters can be merged
- Global parameters that reference a Material correctly identified under Usage
Customers also provided a lot of great ideas about new features that we would love to add in our next release. Have a feature you’d like us to consider? Let us know.
About the Author
Richard W. Taylor, Associate AIA – Technical Evangelist
Richard has more than 30 years of experience working for companies that develop architectural and engineering software solutions, such as Intergraph, Bentley, and Autodesk. He has over 20 years of Revit experience, and he was part of the original development of Revit while at Revit Technology Corporation. He worked for 12 years at Autodesk, where he presented, taught, and worked to improve features in Revit. Richard holds both a Bachelor of Science in Architectural Studies and Master of Architecture from the University of Nebraska, Lincoln. As Technical Evangelist, Richard works with AECO clients worldwide, developing and consulting on BIM solutions. Find Richard on Twitter and LinkedIn.